| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner and method for optimizing the device parameter for the aligner by judging whether the device parameter set in the aligner is optimum or not, and to provide an optimizing method as and a system. SOLUTION: The exposure method comprises a step for obtaining information on an alignment mark used for an alignment of a reticle (mask) and the body to be exposed and formed on a body to be exposed while changing the device parameter settable in the exposure device, a step for optimizing the device parameter of the aligner based on the information on the alignment mark obtained by the obtaining step, and a step for transferring the pattern formed on the reticle (mask) employing the aligner having the optimized device parameter. COPYRIGHT: (C)2004,JPO
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