| 摘要 |
<P>PROBLEM TO BE SOLVED: To make it possible to open and close gas feed ports and/or gas exhaust ports in accordance with the dimensions (width) of a substrate to be treated. <P>SOLUTION: The system for treating the substrate to be treated with glow discharge plasma generated by applying an electric field to the space between counter electrodes is provided with a treatment gas introduction means for introducing a treatment gas into the space between the counter electrodes. The treatment gas introduction means is provided with many gas feed ports 5 and gas exhaust ports arranged along the longitudinal direction of the counter electrodes. The many gas feed ports 5 are partitioned into a plurality of areas E1 to En along the longitudinal direction of the electrodes. Then, an opening and closing means of opening and closing all the gas feed ports 5 inside the area is provided per each partition area E1 to En. The opening and closing means is composed of one opening and closing valve 23 provided at a piping part 22 before the branching of each gas flow passage 21 introducing the treatment gas into each gas feed port 5 inside each partition area E1 to En. <P>COPYRIGHT: (C)2004,JPO |
