发明名称 Process for production of partially protected poly(hydroxystyrene)s
摘要 A process for making poly(hydroxystyrene)s whose phenolic hydroxyl groups are partially protected by acid-decomposable or -eliminable groups, by which the degree of deblocking of the phenolic hydroxyl groups is controlled. Namely, the production of a polymer containing, in the molecule, repeating units of the general formula (IA) and those of the general formula (IB), comprising adding an acid to polymer (B) containing in the molecule repeating units of general formula (II) in an organic solvent with the molar ratio of the acid to the OR3 group being 0.0001 equivalent or above but below 0.05 equivalent, and reacting the polymer with the acid. In the general formulae, R1 is hydrogen or methyl; R2 is C1-6 alkyl; R3 is an acid-decomposable or -eliminable group; R4 is hydrogen or a group derived from R3 by decomposition with acid; and p is 0, 1, or 2, with the proviso that the IB/IA molar ratio ranges 98/2 to 30/70.
申请公布号 US2004063863(A1) 申请公布日期 2004.04.01
申请号 US20030466390 申请日期 2003.07.16
申请人 MURAMOTO HIROO;KIMIZUKA SHINICHI 发明人 MURAMOTO HIROO;KIMIZUKA SHINICHI
分类号 C08F8/00;C08F212/14;(IPC1-7):C08F112/08 主分类号 C08F8/00
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