发明名称 |
Direct-write lithography method for forming sub-micrometer structure, e.g. photonic crystals, by interpolating layout data in-situ and selecting dose modulation to give exposure of circular areas by proximity effect |
摘要 |
Only the characteristic layout data of the borders of a rectangular area are stored in a storage medium for control of an electron beam. The remaining layout data are interpolated in-situ, and the dose modulation of the electron beam when directly writing the rectangular areas in relation to circular areas to be formed is selected so that a specific overexposure leads to exposure of circular areas by the proximity effect. |
申请公布号 |
DE10243827(A1) |
申请公布日期 |
2004.03.25 |
申请号 |
DE2002143827 |
申请日期 |
2002.09.14 |
申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. |
发明人 |
STEINGRUEBER, RALF |
分类号 |
G03F7/20;H01J37/317 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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