| 摘要 |
PROBLEM TO BE SOLVED: To determine a thin-film multi-layer structure by setting a combined model of film thickness and complex index of refraction, calculating the simulation spectrum thereof, and fitting the simulation spectrum to measured spectrum by using Extended Best Local Minimum Calculation (EBLMC) in the analysis method of a thin-film n-layer structure by using a spectral ellipsometer. SOLUTION: This analysis method for a thin-film three-layer structure (d1, d2, d3) by using the spectral ellipsometer comprises a spectral measuring phase capable of providing measured data on a specimen 4 by using the spectral ellipsometer, an analysis phase 1 determining the initial model of the thin-film three-layer structure, an analysis phase 2 having a first stage determining the unidentified constant of a noted layer among the three-layer structure by the EBLMC and a second stage determining the constant of the other layer by the EBLMC in the initial model, and an analysis phase 3 in which the final fitting of the model provided in the analysis phase 2 is performed, and the results are confirmed and stored. COPYRIGHT: (C)2004,JPO
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