| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a composition for a polishing agent, excellent in close adhesion to a substrate and recoating property in addition to durability, capable of satisfying both of these characteristics with peeling property by an alkali in a high level simultaneously and further reducing or not containing a low boiling point film-forming assistant or plasticizer. <P>SOLUTION: This composition for the polishing agent contains a copolymer of (a) 5-50 wt. % ethylenic unsaturated carboxylic acid monomer and/or its salt, (b) 0.05-20 wt. % ethylenic unsaturated sulfonic acid monomer and/or its salt and (c) another ethylenic unsaturated monomer copolymerizable with the components (a), (b) [provided that (a)+(b)+(c)=100 wt. %], as an aqueous emulsion of the copolymer having (-)30-(+)20°C range glass transition point, and is obtained by performing the reaction of the copolymer with a multi-valent metal compound. <P>COPYRIGHT: (C)2004,JPO |
