| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum treatment system which prevents stagnation of film forming gases, improves film quality and is substantially trouble-free. SOLUTION: The vacuum treatment system has a chamber 21 for forming a film forming room, a film forming unit 22 disposed vertically within the chamber, and a substrate heating heater 24 disposed on at least one side part of the film forming unit and applies film formation to a substrate by the film forming unit in the state of heating the substrate supported on the basis of its lower end side to a position opposite to the film forming unit by a substrate heating heater. The film forming unit is provided with a gas pipe electrode 31 arranged to face the substrate and a deposition-preventing plate 30 for covering the back of the gas pipe electrode. Since the apex of the deposition-preventing plate is formed as a perforated plate, the film quality can be improved without allowing the film forming gases to stagnate. Also, the trouble of the system itself by the adhesion of powder and granular materials can be prevented. COPYRIGHT: (C)2004,JPO
|
