发明名称 |
Etching for silicon surfaces and layers, used in photovoltaic, semiconductor and high power electronics technology, for producing photodiode, circuit, electronic device or solar cell, is thickened alkaline liquid |
摘要 |
Medium for etching silicon surfaces and layers is a thickened alkaline liquid. An Independent claim is also included for an etching process, in which this medium is applied to all or the required part of the surface and removed again after an action time of 30 seconds to 5 minutes.
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申请公布号 |
DE10241300(A1) |
申请公布日期 |
2004.03.18 |
申请号 |
DE2002141300 |
申请日期 |
2002.09.04 |
申请人 |
MERCK PATENT GMBH |
发明人 |
KUEBELBECK, ARMIN;KLEIN, SYLKE;STOCKUM, WERNER |
分类号 |
C09K13/02;H01L21/306;(IPC1-7):C23F1/32;C03C15/00 |
主分类号 |
C09K13/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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