发明名称 Etching for silicon surfaces and layers, used in photovoltaic, semiconductor and high power electronics technology, for producing photodiode, circuit, electronic device or solar cell, is thickened alkaline liquid
摘要 Medium for etching silicon surfaces and layers is a thickened alkaline liquid. An Independent claim is also included for an etching process, in which this medium is applied to all or the required part of the surface and removed again after an action time of 30 seconds to 5 minutes.
申请公布号 DE10241300(A1) 申请公布日期 2004.03.18
申请号 DE2002141300 申请日期 2002.09.04
申请人 MERCK PATENT GMBH 发明人 KUEBELBECK, ARMIN;KLEIN, SYLKE;STOCKUM, WERNER
分类号 C09K13/02;H01L21/306;(IPC1-7):C23F1/32;C03C15/00 主分类号 C09K13/02
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