| 摘要 |
Maskless patterning of high-resolution microelectronics features onto large curved substrates. A computer controls individual pixel elements in a spatial light modulator array (SLM) which provides the pattern. Maintaining optical track length constant is by software control of SLM vertical positioning, surface configuration and tilt. SLMs are on/off devices, either reflective or transmissive, such as digital micromirror devices (DMD) and liquid crystal light modulator arrays (LCLM). High-resolution spatial light modulator arrays currently have no capacity for changing or control of their average surface configurations. It is proposed to segment the SLM into smaller array chips, each mounted on a vertical positioner, such as a piezo-actuator, to provide the desired configuration to the surface defined by the spatial light modulator arrays. As an additional means to accommodate the variable surface configuration of the curved surface, a flexmirror (adaptive mirror) may be inserted between projection lens subsystem and the SLM array, defining the wavefront of pixel sub-beams striking the surface of the substrate and enabling the optical conjugates to be kept constant for a greater range of substrate curvatures.
|
