发明名称 APPARATUS FOR FABRICATING SEMICONDUCTOR
摘要 PURPOSE: An apparatus for fabricating a semiconductor is provided to measure a gradient of a susceptor in a state of vacuum by installing a level measurement instrument in CVD(Chemical Vapor Deposition) equipment. CONSTITUTION: An apparatus for fabricating a semiconductor includes a process chamber(100), a susceptor(140), a level measurement instrument, and a level adjustment portion. The process chamber(100) includes a housing and a cover for opening or shutting the housing. The susceptor(140) is installed within the housing. The susceptor is used for heating a substrate. The level measurement instrument is used for measuring a gradient of the susceptor. The level adjustment portion adjusts the gradient of the susceptor.
申请公布号 KR20040022278(A) 申请公布日期 2004.03.12
申请号 KR20020052731 申请日期 2002.09.03
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JUNG, JAE YONG;LEE, BYEONG GEUN
分类号 H01L21/205;(IPC1-7):H01L21/205 主分类号 H01L21/205
代理机构 代理人
主权项
地址