发明名称 |
APPARATUS FOR FABRICATING SEMICONDUCTOR |
摘要 |
PURPOSE: An apparatus for fabricating a semiconductor is provided to measure a gradient of a susceptor in a state of vacuum by installing a level measurement instrument in CVD(Chemical Vapor Deposition) equipment. CONSTITUTION: An apparatus for fabricating a semiconductor includes a process chamber(100), a susceptor(140), a level measurement instrument, and a level adjustment portion. The process chamber(100) includes a housing and a cover for opening or shutting the housing. The susceptor(140) is installed within the housing. The susceptor is used for heating a substrate. The level measurement instrument is used for measuring a gradient of the susceptor. The level adjustment portion adjusts the gradient of the susceptor.
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申请公布号 |
KR20040022278(A) |
申请公布日期 |
2004.03.12 |
申请号 |
KR20020052731 |
申请日期 |
2002.09.03 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JUNG, JAE YONG;LEE, BYEONG GEUN |
分类号 |
H01L21/205;(IPC1-7):H01L21/205 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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