发明名称 Inspecting method and apparatus for repeated micro-miniature patterns
摘要 An apparatus for inspecting foreign matter in repeated micro-miniature patterns formed upon a surface of an object to be inspected, comprising: an inspection light illuminating device for irradiating an inspection light directed upon the surface of the object to be inspected, on which the repeated micro-miniature patterns are formed; a scattered light detector for detecting scattered light of the inspection light being scattered upon the surface said object to be inspected; means for obtaining a first information related to a foreign matter attaching upon the surface of said object to be inspected, which is obtained on a basis of the detection of said scattered light by said scattered light detector; an illumination means for applying a bright field illumination upon the surface of the object to be inspected, on which the repeated micro-miniature patterns are formed; means for picking up the image of the foreign matter, under a bright field illumination by said illumination means; means for obtaining a second information related to said foreign matter, depending upon an image of said foreign matter, which is obtained on a basis of said picking up of the image by said image picking up means under the bright field illumination; and means for displaying said first information and said second information, both being related to said foreign matter, on a display screen thereof.
申请公布号 US2004047500(A1) 申请公布日期 2004.03.11
申请号 US20030656221 申请日期 2003.09.08
申请人 TAGUCHI JUNICHI;SUGIMOTO ARITOSHI;IKOTO MASAMI;INOUE YUKO;WATANABE TETSUYA;SHINKE WAKANA 发明人 TAGUCHI JUNICHI;SUGIMOTO ARITOSHI;IKOTO MASAMI;INOUE YUKO;WATANABE TETSUYA;SHINKE WAKANA
分类号 G01N21/956;G06T7/00;(IPC1-7):G06K9/00 主分类号 G01N21/956
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