| 摘要 |
PROBLEM TO BE SOLVED: To provide a sulfonic acid ester compound which is useful as a monomer for the base polymers of resist materials suitable for fine processing technology, especially chemical amplification resist materials. SOLUTION: This sulfonic acid ester compound represented by general formula (1a), (1b) or (1c) (R<SP>1</SP>is methylene, oxygen atom, or sulfur atom; R<SP>2</SP>is H, an acid-unstable group, or a 1 to 4C straight chain or branched oxyalkyl; R<SP>3</SP>is a single bond or a 1 to 3C alkylene; R<SP>4</SP>and R<SP>5</SP>are each H, F, a 1 to 4C alkyl or a fluorinated alkyl; at least one of R<SP>4</SP>and R<SP>5</SP>contains one or more fluorine atoms). The resist material using a polymer produced from the sulfonic acid ester compound as a monomer is useful for being finely processed with electron beam, far IR light, especially F<SB>2</SB>laser, because having excellent transparency and excellent substrate adhesiveness. COPYRIGHT: (C)2004,JPO
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