发明名称 FORMING METHOD AND ITS DEVICE OF STABILIZED LAYER
摘要 PROBLEM TO BE SOLVED: To provide a forming method of a stabilized layer and a device for it capable of carrying out both of formation of the stabilized layer and oxygen annealing of an oxide superconductive film, and curtailing of a manufacturing time to a large extent. SOLUTION: By fitting a transfer reel and two free reels in a film-forming treatment chamber and a long base material is transferred wound on the two free reels, the base material is kept detained near a film-forming device for a long time, during which, a stabilized layer is formed by an electron beam deposition method, and at the same time, the formation of the stabilized layer and the oxygen annealing of the oxide superconductive film are carried out simultaneously with ozone gushed out in the vicinity. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004071410(A) 申请公布日期 2004.03.04
申请号 JP20020230518 申请日期 2002.08.07
申请人 FUJIKURA LTD 发明人 KAKIMOTO KAZUTOMI;IIJIMA YASUHIRO
分类号 C23C14/14;C23C14/30;H01B12/06;H01B13/00;(IPC1-7):H01B13/00 主分类号 C23C14/14
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