发明名称 |
Method for controlling a refractive index of a dry plating film and method for making a dry plating built-up film |
摘要 |
A method for making a dry plating built-up film comprises providing silicon carbide as a starting source and subjecting to dry plating while changing a concentration of a reactive gas continuously or intermittently to deposit and form, on a substrate, a thin film having different refractive indices along its thickness. A method for making a sputter built-up film is also described, which comprising providing silicon carbide as a target and subjecting to sputtering while changing making electric power against the target continuously or intermittently to deposit and form a thin film having different refractive indices along its thickness.
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申请公布号 |
US2004040836(A1) |
申请公布日期 |
2004.03.04 |
申请号 |
US20030647251 |
申请日期 |
2003.08.26 |
申请人 |
BRIDGESTONE CORPORATION |
发明人 |
YOSHIKAWA MASATO;OHNO SHINGO;KUMAGAI SHO |
分类号 |
C23C14/00;C23C14/06;C23C14/34;C23C14/54;(IPC1-7):C23C14/32 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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