| 摘要 |
PROBLEM TO BE SOLVED: To provide a regulating method of a lighting system and a regulating method of an aligner having excellent workability and regulating a position of a light source, and to provide the lighting system and the aligner. SOLUTION: The aligner EX is provided with a lighting optical system IL for illuminating a mask M forming a pattern by exposure light EL from the light source 10, and a projection optical system PL for transferring a pattern image on a photosensitive substrate P. From among the lighting optical systems IL, a light receiving device 15 receiving partial exposure light EL branched with a half mirror 9 is provided at a position substantially conjugate to the mask M. Information concerning the exposure light EL received with the light receiving device 15 is displayed on a display 30 for regulating the position of a lamp 1 of the light source 10. COPYRIGHT: (C)2004,JPO |
