发明名称 FILM-THICKNESS MEASURING METHOD AND FILM-THICKNESS MEASURING APPARATUS
摘要 PURPOSE: To provide a film-thickness measuring method which uses spectrometry and can be used for a double film, constituted of a plurality of layers having different refractive indexes. CONSTITUTION: On the basis of a special feature of waveform of interference spectrum, a measurement spectrum waveform can be expressed approximately, by using a linear combination of a plurality of base spectra. By using base spectra, wherein the period is fixed previously as a variable, approximate spectrum wherein square spread to measurement spectrum becomes a minimum is found for each period, and the relation between the minimum square spread and periods is obtained as a graph. Correspondence between the respective layers of the double film and extremum dots of a minimum square spread which appear plurally in the case of a double film is obtained. The film thickness is calculated from the period, which gives extremum dots to each layer and the refractive index of the layer.
申请公布号 KR20040018220(A) 申请公布日期 2004.03.02
申请号 KR20030058383 申请日期 2003.08.22
申请人 SHIMADZU CORPORATION 发明人 SHINYA KAZUNARI;NISHIMURA TAKASHI
分类号 G01B11/06;(IPC1-7):H01L21/66 主分类号 G01B11/06
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