发明名称 Silicon carbide semiconductor device used in electronics comprises a silicon carbide substrate having an error-aligned surface with a specified outer axial direction
摘要 Silicon carbide semiconductor device comprises a silicon carbide substrate (10) having an error-aligned (0001) surface with an outer axial direction (11-20), and a trench (11) formed on the substrate and having a strip structure extending in a (11-20) direction. An epitaxial layer made from silicon carbide is formed on the inner surface of the trench. Independent claims are also included for alternative silicon carbide semiconductor devices.
申请公布号 DE10334819(A1) 申请公布日期 2004.02.26
申请号 DE20031034819 申请日期 2003.07.30
申请人 DENSO CORP., KARIYA 发明人 KATAOKA, MITSUHIRO;TAKEUCHI, YUUICHI;NAITO, MASAMI;KUMAR, RAJESH;MATSUNAMI, HIROYUKI;KIMOTO, TSUNENOBU
分类号 H01L29/80;H01L21/04;H01L21/337;H01L29/04;H01L29/24;H01L29/808;(IPC1-7):H01L29/04 主分类号 H01L29/80
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