发明名称 |
Silicon carbide semiconductor device used in electronics comprises a silicon carbide substrate having an error-aligned surface with a specified outer axial direction |
摘要 |
Silicon carbide semiconductor device comprises a silicon carbide substrate (10) having an error-aligned (0001) surface with an outer axial direction (11-20), and a trench (11) formed on the substrate and having a strip structure extending in a (11-20) direction. An epitaxial layer made from silicon carbide is formed on the inner surface of the trench. Independent claims are also included for alternative silicon carbide semiconductor devices.
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申请公布号 |
DE10334819(A1) |
申请公布日期 |
2004.02.26 |
申请号 |
DE20031034819 |
申请日期 |
2003.07.30 |
申请人 |
DENSO CORP., KARIYA |
发明人 |
KATAOKA, MITSUHIRO;TAKEUCHI, YUUICHI;NAITO, MASAMI;KUMAR, RAJESH;MATSUNAMI, HIROYUKI;KIMOTO, TSUNENOBU |
分类号 |
H01L29/80;H01L21/04;H01L21/337;H01L29/04;H01L29/24;H01L29/808;(IPC1-7):H01L29/04 |
主分类号 |
H01L29/80 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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