WET CLEANING EQUIPMENT LOADED WITH BUBBLE DETECTING APPARATUS

摘要

PURPOSE: Wet cleaning equipment loaded with a bubble detecting apparatus is provided to be capable of minimizing the generation of defects caused by bubbles. CONSTITUTION: A wet cleaning equipment(100) is provided with a plurality of chemical baths(110,120,130) for storing various chemicals in order to remove contaminants of a wafer when the wafer and a dry unit(190) are dipped for drying the wafer. The wet cleaning equipment further includes a robot arm(150) for sequentially transferring the wafer from the chemical baths to the dry unit and a plurality of bubble detecting sensors loaded at each chemical bath for transitorily stopping the wet cleaning process when excessive bubbles generats at the chemical bath. Preferably, a vibration detecting sensor is used as the bubble detecting sensor.