Device for oxidizing a surface, notably a silicon wafer surface, comprises a point or linear heat source moving along a precise crystallographic direction, and a rotary support table to facilitate orientation

摘要

A device for the oxidation of surfaces, notably of silicon surfaces, comprises a point or linear heat source (1 and 2), mobile with respect to the surface (4) to be oxidized along a precise crystallographic direction. The support table (3) for the surface to be oxidized is rotary to facilitate orientation of the surface.