| 摘要 |
PROBLEM TO BE SOLVED: To provide a magnetic storage device and its manufacturing method capable of reducing an over-etching. SOLUTION: The method for manufacturing the magnetic storage device comprises a step of sequentially forming a metal layer 13, a magnetic resistance effect film 14 and mask layers 15, 16 on a first insulating film 11, and a step of, after the mask layer 15 was patterned in an element shape of a magnetic resistance effect element 19, patterning in an isolated shape of isolating the metal layer 13 in each cell. COPYRIGHT: (C)2004,JPO
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