发明名称 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby |
摘要 |
A lithographic projection apparatus in which a vacuum chamber provided with a vacuum generator constructed and arranged to generate a vacuum beam path for the projection beam, wherein the apparatus is provided with a collision protection apparatus for reducing the effects of a collision of an object table with the wall of the vacuum chamber or with another object table. These collisions may occur during a power failure or an error in a programmed control logic in a controller of the apparatus.
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申请公布号 |
US2004031932(A1) |
申请公布日期 |
2004.02.19 |
申请号 |
US20030458726 |
申请日期 |
2003.06.11 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VOSTERS PETRUS MATTHIJS HENRICUS;JACOBS HERNES;VAN HEUMEN MARK;KEMPER NICOLAAS RUDOLF |
分类号 |
G03F7/20;H01L21/027;(IPC1-7):A61N5/00;G21G5/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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