发明名称 Lithographic apparatus, device manufacturing method, and device manufactured thereby
摘要 A lithographic projection apparatus in which a vacuum chamber provided with a vacuum generator constructed and arranged to generate a vacuum beam path for the projection beam, wherein the apparatus is provided with a collision protection apparatus for reducing the effects of a collision of an object table with the wall of the vacuum chamber or with another object table. These collisions may occur during a power failure or an error in a programmed control logic in a controller of the apparatus.
申请公布号 US2004031932(A1) 申请公布日期 2004.02.19
申请号 US20030458726 申请日期 2003.06.11
申请人 ASML NETHERLANDS B.V. 发明人 VOSTERS PETRUS MATTHIJS HENRICUS;JACOBS HERNES;VAN HEUMEN MARK;KEMPER NICOLAAS RUDOLF
分类号 G03F7/20;H01L21/027;(IPC1-7):A61N5/00;G21G5/00 主分类号 G03F7/20
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