NOVEL RESINS AND PHOTORESIST COMPOSITION COMPRISING THE SAME

摘要

PURPOSE: A photoresist composition is provided to significantly improve the lithographic performance of a photoresist and to enhance the smooth profile (such as reduced line edge roughness) of the developed relief image. CONSTITUTION: The photoresist composition comprises a photoactive component and a resin that comprises hetero-substituted carbocyclic aryl groups, the resin substantially free of aromatic groups other than the hetero-substituted carbocyclic aryl groups. Further, the method for providing a photoresist relief image comprises (a) applying a coating layer of the above photoresist composition on a substrate; and (b) exposing the photoresist composition layer to activating radiation having a wavelength of less than 200 nm and developing the exposed photoresist composition coating layer.