发明名称 FILM FOR CONNECTING SUBSTRATES AND METHOD FOR ETCHING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To eliminate the heterogenic phenomenon of etching in conveying direction at the upper surface side of plurality of substrates by providing a film for connecting the substrates having a single layer structure and such strength as not to separate the substrates at the etching part when the plurality of substrates are connected and etched while conveying. SOLUTION: In the method for etching the plurality of substrates horizontally conveyed with a conveying means, both edge parts in the conveying direction of respective abutted substrates are mutually connected with the film for connecting the substrates forming a positive type resist-film in a belt-like, and while conveying the respective substrates under connecting state, at least the etching treatment and resist-removal are performed. Then, the film for connecting the substrates is removed with resist-removing liquid etc., used for removing the resist to separate the respective substrates. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004035970(A) 申请公布日期 2004.02.05
申请号 JP20020196900 申请日期 2002.07.05
申请人 NIPPON TEKKU KK;MITSUBISHI PAPER MILLS LTD 发明人 IIDA MASUO;IRISAWA MUNETOSHI;HYODO KENJI
分类号 C23F1/00;H05K3/06;(IPC1-7):C23F1/00 主分类号 C23F1/00
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