| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a synthesizing method of a heat-resistant resin precursor composition and a photosensitive heat-resistant resin precursor composition containing a little chloride ion content. <P>SOLUTION: A method of producing for the heat-resistant resin precursor composition comprises, in a process of synthesizing a polymer represented by formula (4) (wherein R13 and R15 are each a divalent 2-20C organic group; R14 is a tri-hexa-valent 2-20C organic group; R16 is a tri-tetra-valent 2-30C organic group; R17 is a hydrogen atom or a monovalent 1-20C organic group; l is 1-10,000; t is an integer of 1-4; and u is 1 or 2), when a hydroxydiamino compound comprising, as a principal component, a structure unit represented by formula (3) (wherein R10 and R12 are each a divalent 2-20C organic group; R11 is a tri-hexa-valent 2-20C organic group; and s is an integer of 1-4) is synthesized by reacting a nitrocarboxylic acid chloride with a hydroxydiamine, making dehydrochlorination with an epoxy compound and/or a compound having an unsaturated bond. <P>COPYRIGHT: (C)2004,JPO |
