| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem that necessary uniform temperature and temperature response cannot be obtained due to uneven temperature of the wafer supporting member. SOLUTION: The wafer supporting member includes a plurality of resistance heater zones on one main surface of a plate-like ceramic unit and a placing surface for placing a wafer on another main surface. The supporting member further includes a power supply for supplying a power independent of the resistance heater of the resistance heater zone, and a metal case surrounding the power supply. The supporting member also includes a circular resistance heater zone at a center and three annular resistance heater zones of concentric circles at its outside. COPYRIGHT: (C)2004,JPO |
