发明名称 STRUCTURE OF COVER PLATE FOR PHOTO MASK
摘要 PURPOSE: A structure of a cover plate for photo mask is provided to prevent the damage of cover plate caused by contamination material and enhance the productivity by exchanging only a detachable cover. CONSTITUTION: A structure of a cover plate for photo mask includes a photo mask(10), a cover plate(30), and an electrode(40). The photo mask(10) is used for forming a pattern on a photoresist layer laminated on a wafer. The cover plate(30) is used for installing and fixing the photo mask into a rectangular installation groove. The electrode(40) is used for supporting a bottom face of the cover plate(30). A detachable cover is installed between an outer circumference of the photo mask and an inner wall of the cover plate. The detachable cover is formed with quartz.
申请公布号 KR20040007142(A) 申请公布日期 2004.01.24
申请号 KR20020041800 申请日期 2002.07.16
申请人 HYNIX SEMICONDUCTOR INC. 发明人 JUNG, HO YONG
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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