| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for treating a substrate which supplies the substrate with a treating liquid that is prepared by diluting an adding fluid with a diluting fluid without using a mixing tank. SOLUTION: In the treating apparatus in which the substrate is treated with the treating liquid sprayed from the nozzle, there are provided a nozzle main body, a mixing chamber 68 installed in the nozzle main body, a spraying part 69 communicating with the mixing chamber, a first connected hole 65, installed in the nozzle, for supplying the diluting fluid to the mixing chamber, a second connected hole 66, installed in the nozzle, for supplying the adding fluid to be diluted with the diluting fluid, and a third connecting hole 67, installed in the nozzle, for supplying a pressurized gas from the spraying part for pressurizing and spraying the treating liquid prepared by dilution of the adding fluid with the diluting fluid in the mixing chamber. COPYRIGHT: (C)2004,JPO
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