REACTION GAS SUPPLY DEVICE FOR CVD EQUIPMENT

摘要

PURPOSE: A reaction gas supply device for CVD(Chemical Vapor Deposition) equipment is provided to grasp easily the remaining amount of FOX solution within a storage unit by forming the storage unit with transparent materials. CONSTITUTION: A reaction gas supply device for CVD equipment includes a body, a lid, the first stoppers(170), and the second stopper(210). The body is formed with transparent materials. A storage groove is formed in the one side of the body in order to store the chemical solution. The lid is coupled to the body in order to protect the chemical solution from the external environment. The first stoppers(170) are formed at predetermined positions of the lid and the body in order to couple or decouple the lid to or from the body. The second stopper(210) is coupled to the first stopper(170) when the lid is coupled or decoupled to or from the body.