发明名称 APPARATUS AND METHOD FOR CORRECTING FLAW IN SOLID-STATE IMAGING DEVICE
摘要 PROBLEM TO BE SOLVED: To effectively correct continuous flaws and a single (isolated) flaw that appear during a long-term exposure, without increasing the capacity of ROM or the like that stores information on defects in a pixel of a solid-state imaging device. SOLUTION: Positional information on the continuous flaws (flaws that cause a plurality of continuous defects among adjacent pixels), that are difficult be detected from a photographed image among flaws appearing during a long-term exposure, is previously registered on a ROM. Positional information on the isolated flaw (a flaw of a single pixel with respect to other ones), that appears during the long-term exposure is not to be registered. During the long time exposure, such as at night view photographing or the like, normal flaws are first corrected, and then the continuous flaws of long time are corrected, based on the registered information. After that, the isolated flaw is further detected from within the image and corrected. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004015191(A) 申请公布日期 2004.01.15
申请号 JP20020162909 申请日期 2002.06.04
申请人 FUJI PHOTO FILM CO LTD 发明人 MIYASHITA TAKESHI
分类号 G06T5/00;H04N1/40;H04N5/335;H04N5/367;H04N5/369;H04N9/07;(IPC1-7):H04N9/07 主分类号 G06T5/00
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