EXPOSURE APPARATUS FOR SEMICONDUCTOR PROCESS AND EXPOSURE METHOD USING THE SAME

摘要

PURPOSE: An exposure apparatus for a semiconductor process and an exposure method using the same are provided to be capable of simultaneously carrying out an exposure process at two reticles by installing at least two reticle stages at one exposure apparatus. CONSTITUTION: An exposure apparatus is used for selectively carrying out an exposure process at a photoresist layer formed at the upper portion of a semiconductor substrate by using the first and second reticle(130a,130b). At this time, each reticle is used for selectively transmitting the light generated from a light source part(100). The exposure apparatus includes a plurality of reticle stages(140a,140b) for simultaneously loading the reticles. Preferably, the exposure apparatus further includes a selection part for selectively positioning the reticle stages at the predetermined upper portions of the photoresist layer.