THIN FILM SEMICONDUCTOR DEVICE, ITS MANUFACTURE AND IMAGE DISPLAY DEVICE

摘要

PURPOSE: To realize a thin film semiconductor device and an image display device in which a TFT having high performance and reduced in the variety of characteristics of the same is formed on an insulation substrate. CONSTITUTION: The thin film semiconductor device is provided with the insulation substrate and an island region of an isolated mono-crystalline thin film provided on the insulation substrate. The isolated island region of mono-crystalline thin film is formed on the whole surface or a specified region of the insulation substrate utilizing an aggregation phenomenon due to the surface tension of molten semiconductor while the active region of a thin film transistor is formed in the island region.