NEW ESTER COMPOUND, POLYMER COMPOUND, RESIST MATERIAL AND PATTERN-FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an ester compound, a polymer compound and a resist material responding to a high energy beam, excellent in sensitivity in a specific wavelength, improved in transparency and adhesiveness of a resist and permeability of the resist into a developing solution by using a copolymer of a compound containing a sulfonate or a sulfone as a base resin and having excellent plasma etching resistance.

SOLUTION: The sulfonate compound is represented by formula (1) (wherein R1to R3are each H, F or an alkyl group or a fluorinated alkyl group; R4is a single bond or an alkylene group or a fluorinated alkylene group; and R5is a fluorinated alkyl group).

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