| 发明名称 |
Organometallic precursor mixture for forming metal alloy pattern and method of forming metal alloy pattern using the same |
| 摘要 |
An organometallic precursor mixture for forming a metal alloy pattern and a method of forming the metal alloy pattern using the same, wherein the metal alloy pattern having improved adhesive force to a substrate, heat resistance, and resistance to atmospheric corrosion can be readily formed using the organometallic precursor mixture by and exposing step without using a separate photosensitive resin.
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| 申请公布号 |
US2004005412(A1) |
申请公布日期 |
2004.01.08 |
| 申请号 |
US20030440273 |
申请日期 |
2003.05.19 |
| 申请人 |
BYUN YOUNG HUN;HWANG SOON TAIK;YUN BYONG KI;SON HAE JUNG |
发明人 |
BYUN YOUNG HUN;HWANG SOON TAIK;YUN BYONG KI;SON HAE JUNG |
| 分类号 |
C07F1/00;C23C8/02;C23C18/06;C23C18/08;C23C18/14;C23C26/00;C23C30/00;G02F1/1335;G03F7/004;G03F7/075;H01L21/288;H01L21/768;H05K3/10;(IPC1-7):C23C16/06;B05D3/02 |
主分类号 |
C07F1/00 |
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