| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative resist composition for forming photosensitive layers for lamination on a water insoluble antireflection layer of a multilayered photosensitive material of two layers which have an excellent sensitivity and resolution and provide resist patterns of good sectional shapes having reduced edge roughness in forming the fine resist patterns below 200 nm and multilayered photosensitive materials of three layers which provide resist patterns of good sectional shapes suppressed on the occurence of T-shaped sections and having reduced edge roughness without having trails. <P>SOLUTION: The negative resist composition for forming the photosensitive layers for lamination on the water insoluble antireflection layer containing (A) an alkaline soluble resin, (B) an onium salt generating an acid by irradiation with radiations, and (C) glycoluril of which the Nth place is substituted by at least one bridge forming group selected from a hydroxyl alkyl group and lower alkoxy alkyl group at ratios of (B) 0.5 to 20 parts by mass of the component (B) and 3 to 50 parts by mass of the component (C) per 100 parts by mass of the component (A) is provided. <P>COPYRIGHT: (C)2004,JPO |
