发明名称 |
Crystallization apparatus, optical member for use in crystallization apparatus, crystallization method, thin film transistor, and display |
摘要 |
A crystallization apparatus includes an illumination optical system to illuminate a phase shift mask and which irradiates an amorphous semiconductor film with a light beam having an intensity distribution of an inverse peak type having a smallest light intensity in a point corresponding to a phase shift portion of the phase shift mask to generate a crystallized semiconductor film. A convergence/divergence element is disposed on a light path between the illumination optical system and phase shift mask. The convergence/divergence element converts the light beam supplied from the illumination optical system into a light beam having an upward concave intensity distribution in which the light intensity is lowest in the phase shift portion and in which the light intensity increases as distant from the phase shift portion to irradiate the phase shift mask.
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申请公布号 |
US2004005744(A1) |
申请公布日期 |
2004.01.08 |
申请号 |
US20030603771 |
申请日期 |
2003.06.26 |
申请人 |
TANIGUCHI YUKIO;MATSUMURA MASAKIYO;YAMAGUCHI HIROTAKA;NISHITANI MIKIHIKO;TSUJIKAWA SUSUMU;KIMURA YOSHINOBU;JYUMONJI MASAYUKI |
发明人 |
TANIGUCHI YUKIO;MATSUMURA MASAKIYO;YAMAGUCHI HIROTAKA;NISHITANI MIKIHIKO;TSUJIKAWA SUSUMU;KIMURA YOSHINOBU;JYUMONJI MASAYUKI |
分类号 |
H01L21/027;B23K26/06;B23K26/073;C30B13/00;C30B13/24;H01L21/20;H01L21/268;H01L21/336;H01L29/786;(IPC1-7):H01L21/00;H01L21/84 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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