| 摘要 |
PURPOSE: An exposure apparatus for forming a fine pattern is provided to be capable of controlling the size and shape of the pattern. CONSTITUTION: An exposure apparatus for forming a fine pattern is provided with a condensing lens(20) for condensing the light irradiated from a light source(10), a shaping lens(30) for controlling the shape of the light transmitted from the condensing lens, and a mask image part(40) having an image transforming chip(42) for transforming the light transmitted from the shaping lens into an aiming pattern. The exposure apparatus further includes a projection lens(70) for projecting the light reflected from the image transforming chip to a wafer(80). Preferably, the wavelength of the light source is in the range of 10-365 nm.
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