DEVICE FOR TREATING SUBSTRATES BY LASER RADIATION

摘要

The invention relates to a device for treating substrates by laser radiation. The inventive device comprises a revolving mirror (16) or the like through which an incident laser beam (12) is reflected in various beam paths whose beams can be focused onto the substrate (10) in such a manner that the various beam paths result in different positions of the respective focal points on the substrate. One common focus lens (26) is associated with at least two beam paths and is used to focus the respective beams on the respective positions onto the substrate (10).