发明名称 PROCESSING DEVICE AND PROCESSING METHOD
摘要 A chamber (12) having a substantially triangular cross-section has at one side thereof a gas supply port (13) and at its apex opposed thereto an exhaust port (14). Further, the gas supply port (13) is provided with a shower head-like gas supply section (15). Thereby, the chamber (12) is arranged such that the cross-sectional area (S) of a gas flow channel formed to extend from the gas supply port (13) to the exhaust port (14) gradually decreases toward the gas supply direction (x-direction). At this time, the thickness (delta) of the boundary layer (28) formed on the wall surface of the chamber (12) is substantially constant.
申请公布号 WO03104525(A1) 申请公布日期 2003.12.18
申请号 WO2003JP07293 申请日期 2003.06.09
申请人 TOKYO ELECTRON LIMITED;ISHIZAKA, TADAHIRO;GUNJI, ISAO;KANNAN, HIROSHI;SAWADA, IKUO;KOJIMA, YASUHIKO 发明人 ISHIZAKA, TADAHIRO;GUNJI, ISAO;KANNAN, HIROSHI;SAWADA, IKUO;KOJIMA, YASUHIKO
分类号 C23C16/455;(IPC1-7):C23C16/455;H01L21/31 主分类号 C23C16/455
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