发明名称 |
Method for making extreme ultraviolet lithography structures |
摘要 |
A method for forming EUV LITHOGRAPHY GLASS STRUCTURES WITH VOIDS is disclosed which includes forming a slurry mixture including silica soot particles, and inserting the slurry mixture into a casting mold. The method provides low weight mass reduced rigid glass structures with beneficial thermal stability. The casting mold includes therein a casting form. The casting form is adapted to provide selected geometry void spaces within the glass lithography structure. The slurry mixture is dried to form a green ware object. The casting form is removed from the green ware and the green ware object is consolidated into a lithography glass structure with voids.
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申请公布号 |
US2003226375(A1) |
申请公布日期 |
2003.12.11 |
申请号 |
US20020302347 |
申请日期 |
2002.11.22 |
申请人 |
BERNAS JAMES J.;BOWDEN BRADLEY F.;HRDINA KENNETH E. |
发明人 |
BERNAS JAMES J.;BOWDEN BRADLEY F.;HRDINA KENNETH E. |
分类号 |
C03B19/06;C03C3/06;(IPC1-7):C03B19/08 |
主分类号 |
C03B19/06 |
代理机构 |
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地址 |
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