| 摘要 |
PURPOSE: An apparatus for fixing a substrate is provided to reduce the defective ratio by uniformly applying heat to the substrate. CONSTITUTION: A porous plate(32) receives a substrate(30) of which an object to be dried is formed on an upper surface and is capable of vacuum-absorbing the substrate(30). A frame(35) is provided with the porous plate(32). A vacuum passage unit(37) is formed between the porous plates. A vacuum unit(38) is connected to the vacuum passage unit(37) and supplies vacuum force so as to be capable of vacuum-absorbing the substrate(30) with respect to the porous plate(32). The porous plate(32) is made of metal. A plurality of pin holes(32a) are formed on the porous plate(32). A push pin(34) is inserted into the pin holes(32a). The push pin(34), which is elevated by an elevating unit, separates the substrate(30) from the porous plate(32).
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