发明名称 |
Thin film apparatus, a manufacturing method of the thin film apparatus, an active matrix substrate, a manufacturing method of the active matrix substrate, and an electro-optical apparatus having the active matrix substrate |
摘要 |
A manufacturing method of a thin film apparatus, includes: a first step for forming a separation layer on a heat resistant substrate; a second step for forming a thin film device on the separation layer; a third step for providing a surface layer on the thin film device; and a fourth step for generating a peeling phenomenon at the interface of the separation layer and the heat resistant substrate so as to peel the heat resistant substrate from a side of the thin film device.
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申请公布号 |
US2003223138(A1) |
申请公布日期 |
2003.12.04 |
申请号 |
US20030418109 |
申请日期 |
2003.04.18 |
申请人 |
AKIYAMA YOSHIKAZU |
发明人 |
AKIYAMA YOSHIKAZU |
分类号 |
G02F1/1333;G02F1/1368;G02F1/167;G09F9/00;G09F9/30;G09F9/35;H01L21/02;H01L21/336;H01L27/12;H01L27/32;H01L29/786;H01L51/05;H01L51/40;H01L51/56;(IPC1-7):G02B5/08;G02B7/182 |
主分类号 |
G02F1/1333 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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