| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To form a core having a desired uniform refractive index, to easily and accurately obtain the desired difference in the refractive index with a clad, and to easily and accurately pattern-form the core on a lower clad even when the clad and the core are made of similar materials. <P>SOLUTION: The lower clad 2, the core 3, and an upper clad 4 are formed by a chemical vapor deposition (CVD) method, in which at least one kind of an oxygen additive amount, a nitrogen additive amount, and a silicon additive amount for a silicon oxynitride film is adjusted so that the core 3 has a desired refractive index higher than those of the clads 2 and 4. An end point detector 9 which becomes an etching stopper for the dry etching in pattern-forming the core 3 is formed. <P>COPYRIGHT: (C)2004,JPO</p> |
