TREATMENT APPARATUS FOR SEMICONDUCTOR MANUFACTURING WASTE GAS

摘要

PROBLEM TO BE SOLVED: To collect a silica powder discharged from a semiconductor manufacturing process by a bag filter to feed the same out of the system without closing the bag filter. SOLUTION: A treatment apparatus for semiconductor manufacturing waste gas is equipped with the first bag filter for collecting the silica powder contained in exhaust gas generated by the combustion treatment of waste gas discharged from the semiconductor manufacturing process, the second bag filter for sucking the silica powder falling to a lower hopper part of the first bag filter to collect the same and an induction blower for sucking the gas of the hopper part of the first bag filter through the second bag filter. The discharged gas of the induction blower is used as the backward washing gas of the first bag filter. COPYRIGHT: (C)2004,JPO