发明名称 SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
摘要 <p>In a controller MC, information on a process room (PM) (last process PM) which conducted a process last for the previous lot is stored. When starting processing for the current lot, the semiconductor wafers W are loaded in process rooms, beginning with the process room next to the last process PM (for example, a process room (PM2) when the last process PM is a process room (PM1)). This allows the processors to be used evenly and minimizes variations in maintenance cycles and in the wearing of parts in the processors.</p>
申请公布号 WO03098684(A1) 申请公布日期 2003.11.27
申请号 WO2003JP05597 申请日期 2003.05.02
申请人 TOKYO ELECTRON LIMITED;NUMAKURA, MASAHIRO 发明人 NUMAKURA, MASAHIRO
分类号 H01L21/677;G05B19/418;H01L21/00;H01L21/02;(IPC1-7):H01L21/68 主分类号 H01L21/677
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