| 摘要 |
A method is provided that includes (1) receiving information about a substrate etched within an etch subsystem from an integrated inspection system of the etch subsystem; (2) determining a deposition process to perform within a deposition subsystem based at least in part on the information received from the inspection system of the etch subsystem; (3) directing the deposition subsystem to deposit an insulating material on the substrate based on the deposition process; (4) receiving information about the insulating material deposited on the substrate from an integrated inspection system of the deposition subsystem; (5) determining a planarization process to perform within a planarization subsystem based at least in part on the information received from the inspection system of the deposition subsystem; and (6) directing the planarization subsystem to planarize the substrate based on the planarization process. Other methods, systems, apparatus, data structures and computer program products are also provided.
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