DEVICE FOR SUBSTRATE TREATMENT BY MEANS OF LASER RADIATION

摘要

A device, for substrate treatment by means of laser radiation, comprises a polygonal rotating mirror (16), by means of which at least one incident laser beam is reflected, which may be pivoted over an arrangement (24) of adjacent converging lenses, arranged at a separation from the substrate corresponding exactly or approximately to the focal length thereof. The polygonal rotating mirror is divided into at least two regions comprising facets and adjustable such that various regions (16', 16'') may be brought into the beam path of the laser radiation and correspondingly variable sweep or fanning angles for the laser beam reflected from the polygonal rotating mirror may be set.