发明名称 FORMATION OF SINGLE-CRYSTAL SILICON CARBIDE
摘要 The invention concerns a device (10) for forming in single-crystal state a compound body with incongruent evaporation, capable of being in monocrystalline or polycrystalline form, comprising at least one first chamber (20) containing a substrate (42) whereat is formed a polycrystalline source of said body and a monocrystalline germ (46) of said body; a second chamber (14), said substrate being arranged between the two chambers; means for input (36) of gaseous precursors of said body into the second chamber capable of bringing about deposition of said body in polycrystalline form on the substrate; and heating means (26) for maintaining the substrate at a temperature higher than the temperature of the germ so as to bring about sublimation of the polycrystalline source and the deposition on the germ of said body in monocrystalline form.
申请公布号 WO03097905(A2) 申请公布日期 2003.11.27
申请号 WO2003FR01480 申请日期 2003.05.15
申请人 CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE;INSTITUT NATIONAL POLYTECHNIQUE DE GRENOBLE;NOVASIC;MADAR, ROLAND;PONS, MICHEL;BAILLET, FRANCIS;CHARPENTIER, LUDOVIC;PERNOT, ETIENNE;CHAUSSENDE, DIDIER;TUROVER, DANIEL, M. 发明人 MADAR, ROLAND;PONS, MICHEL;BAILLET, FRANCIS;CHARPENTIER, LUDOVIC;PERNOT, ETIENNE;CHAUSSENDE, DIDIER;TUROVER, DANIEL, M.
分类号 C30B23/00;C30B23/02 主分类号 C30B23/00
代理机构 代理人
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