发明名称 |
Photomask having a focus monitor pattern |
摘要 |
A photomask has a device pattern, which has an opening portion and a mask portion, and either a focus monitor pattern or an exposure dose monitor pattern, which has an opening portion and a mask portion and which has the same plane pattern shape as at least a partial region of a device pattern. The phase difference in transmitted exposure light between the opening portion and the mask portion of the focus monitor pattern is different from that between the opening portion and the mask portion of the device pattern. The opening portion of the exposure dose monitor pattern has a different exposure dose transmittance from that of the opening portion of the device pattern. |
申请公布号 |
US2003219655(A1) |
申请公布日期 |
2003.11.27 |
申请号 |
US20030396309 |
申请日期 |
2003.03.26 |
申请人 |
SUTANI TAKUMICHI;IZUHA KYOKO;FUJISAWA TADAHITO;INOUE SOICHI |
发明人 |
SUTANI TAKUMICHI;IZUHA KYOKO;FUJISAWA TADAHITO;INOUE SOICHI |
分类号 |
G03F1/08;G03F1/14;G03F1/26;G03F1/44;G03F1/68;G03F7/20;G03F7/207;G03F9/02;H01L21/027;(IPC1-7):G03F1/00;G03F9/00 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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