| 摘要 |
<p>An extreme ultraviolet light generating device 1 arranged at the uppermost of an X-ray exposure apparatus is provided with a vacuum chamber 4, in which a central discharge electrode 2 and a peripheral discharge electrode 3 are arranged coaxially with each other. The central discharge electrode 2 is formed of tungsten, and a hollow portion 2a thereof is coated with a diamond thin film 10 having a thickness of 0.2 mm. In the hollow portion 2a, the distal end of a cooling water pipe 11 connected to a cooling water supplying device 12 is arranged. The temperature of the cooling water is always kept at about 20 degree C and supplied to the hollow portion 2c of the central discharge electrode 2 through the cooling pipe 11. As the result, the temperature of the central discharge electrode 2 is quickly decreased resulting in preventing the rising of the temperature of the central discharge electrode 2, therefore to reduce the amount of the debris. <IMAGE></p> |
