发明名称 Method for estimating repair accuracy of a mask shop
摘要 A method for estimating repair accuracy of a mask shop. The method includes the steps of providing a mask having a light-shielding layer with a pattern of a plurality of lines, each of which has a defect, using the mask shop to repair the defects, measuring first widths of the lines where the defects are repaired and second and third widths of the lines aside where the defects are repaired, and calculating ratios of mean values of the second and third widths to the first widths for estimating the repair accuracy.
申请公布号 US6654703(B2) 申请公布日期 2003.11.25
申请号 US20010045840 申请日期 2001.11.08
申请人 NANYA TECHNOLOGY CORPORATION 发明人 WU YUAN-HSUN
分类号 G01N21/956;G01Q30/18;G03F1/00;(IPC1-7):G03F9/00 主分类号 G01N21/956
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